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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">sibsutis</journal-id><journal-title-group><journal-title xml:lang="ru">Вестник СибГУТИ</journal-title><trans-title-group xml:lang="en"><trans-title>The Herald of the Siberian State University of Telecommunications and Information Science</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1998-6920</issn><publisher><publisher-name>СибГУТИ</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">sibsutis-311</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title>AlGaN/GaN диоды с барьерами Шоттки на основе Ta, Ni, WSi и TiN</article-title><trans-title-group xml:lang="en"><trans-title>Parameters calculation of a logical channel for a secondary user in a group of two AlGaN/GaN Schottky barrier diodes with Ta, Ni, WSi and TiN anodes</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Федин</surname><given-names>И. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Fedin</surname><given-names>I. ..</given-names></name></name-alternatives><email xlink:type="simple">fedinivanvla-dimirovich@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ерофеев</surname><given-names>Е. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Erofeev</surname><given-names>E. ..</given-names></name></name-alternatives><email xlink:type="simple">erofeev@sibmail.com</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Федина</surname><given-names>В. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Fedina</surname><given-names>V. ..</given-names></name></name-alternatives><email xlink:type="simple">lerochka_2009@mail.ru</email><xref ref-type="aff" rid="aff-3"/></contrib></contrib-group><aff xml:lang="ru" id="aff-1"><institution>АО НПФ «Микран»</institution><country>Russian Federation</country></aff><aff xml:lang="ru" id="aff-2"><institution>НИИСЭС ТУСУР</institution><country>Russian Federation</country></aff><aff xml:lang="ru" id="aff-3"><institution>ТУСУР</institution><country>Russian Federation</country></aff><pub-date pub-type="collection"><year>2018</year></pub-date><pub-date pub-type="epub"><day>24</day><month>10</month><year>2022</year></pub-date><volume>0</volume><issue>3</issue><fpage>62</fpage><lpage>68</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Федин И.В., Ерофеев Е.В., Федина В.В., 2022</copyright-statement><copyright-year>2022</copyright-year><copyright-holder xml:lang="ru">Федин И.В., Ерофеев Е.В., Федина В.В.</copyright-holder><copyright-holder xml:lang="en">Fedin I..., Erofeev E..., Fedina V...</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://vestnik.sibsutis.ru/jour/article/view/311">https://vestnik.sibsutis.ru/jour/article/view/311</self-uri><abstract><p>В данной работе представлены планарные AlGaN/GaN диоды с барьером Шоттки, изготовленные на кремниевой подложке по бездрагметальной технологии с применением ре-цесса анода. В качестве анодов использовались металлизации X/Ti/Al/Ti (30/20/350/20 нм), где X - это Ta, Ni, WSi или TiN. Расстояние анод-катод La-к варьировалось от 3 до 7 мкм. Ширина анода составляла 100 мкм. Для La-к = 7 мкм были получены следующие результаты: напряжение открывания диода (Uotkp) составило 0.25 В, 0.45 В, 0.65 В, 1.6 В для Ta, Ni, WSi и TiN анодов соответственно; ток прямого смещения при U = 1.2 В составил 68 мА/мм, 55 мА/мм, 20 мА/мм и 0.16 мА/мм для Ta, Ni, WSi и TiN анодов соответственно; обратный ток утечки (Ioep) составил 67 мкА/мм, 13 мкА/мм, 5 мкА/мм и 0.85 мкА/мм для Ta, Ni, WSi и TiN анодов соответственно.</p></abstract><trans-abstract xml:lang="en"><p>In this paper, AlGaN/GaN lateral Schottky barrier diodes (SBD) with anodes based on Ta, Ni, WSi and Ta are considered. Heterostructure AlGaN/i-GaN/buffer GaN was grown by Metal Organic Chemical Vapor Deposition (MOCVD) on silicon (111) substrate. All diodes had 5 nm (50%) anodes recess. Anode-cathode distance was varied from 3 to 7 цт. Diodes periphery (anodes width, W) was 10 mm. Diodes turn-ON voltage (by forward current 1 mA/mm) critically depends on anodes material and was 0.25 V, 0.45 V, 0.65 V and 1.6 V for Ta, Ni, WSi and TiN anodes respectively. Specific leakage current also depends on anodes material and was 67 цЛ/тт, 13 цЛ/тт, 5 цЛ/тт and 0.85 цЛ/тт for Ta, Ni, WSi and TiN respectively.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>диоды с барьером Шоттки</kwd><kwd>материал анода</kwd></kwd-group><kwd-group xml:lang="en"><kwd>GaN на кремнии</kwd><kwd>AlGaN/GaN</kwd><kwd>GaN on silicon</kwd><kwd>AlGaN/GaN</kwd><kwd>Schottky barrier diode</kwd><kwd>anode material</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Seikoh Yoshida, Nariaki Ikeda, Jiang Li, Takahiro Wada, Hiroshi Kambayashi, and Hironari Takehara. 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